The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2020
Filed:
Jul. 18, 2017
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-Do, KR;
Inventors:
Seong-Moon Ha, Seoul, KR;
Min-Kyu Sung, Hwaseong-si, KR;
Seung-Hee Cho, Hwaseong-si, KR;
Seong-Chul Choi, Suwon-si, KR;
Kyung-Sun Kim, Suwon-si, KR;
Sang-Ho Lee, Hwaseong-si, KR;
Assignee:
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, Gyeonggi-Do, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01J 37/32 (2006.01); C23C 16/44 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67069 (2013.01); C23C 16/4411 (2013.01); H01J 37/32458 (2013.01); H01J 37/32522 (2013.01); H01L 21/67248 (2013.01); H01L 21/67253 (2013.01); H01J 37/32091 (2013.01); H01J 37/32357 (2013.01); H01J 37/32477 (2013.01); H01J 37/32495 (2013.01); H01J 2237/002 (2013.01);
Abstract
A temperature controller of a plasma-processing apparatus including a heating unit and a cooling unit. The heating unit is configured to heat a liner on an inner surface of a plasma chamber in which a plasma is formed. The cooling unit is configured to cool the liner to controls a temperature of an upper electrode in the plasma chamber.