The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2020

Filed:

Feb. 13, 2019
Applicant:

Takashi Hosaka, Tokyo, JP;

Inventor:

Takashi Hosaka, Tokyo, JP;

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 49/06 (2006.01); H01J 49/42 (2006.01); H01J 49/38 (2006.01); H01J 49/32 (2006.01); H01J 49/00 (2006.01); H05H 13/04 (2006.01); H05H 9/00 (2006.01); H01J 49/20 (2006.01); H05H 7/04 (2006.01); H05H 5/03 (2006.01); G01N 27/62 (2006.01); H01J 49/22 (2006.01); H05H 7/22 (2006.01);
U.S. Cl.
CPC ...
H01J 49/06 (2013.01); G01N 27/62 (2013.01); H01J 49/0018 (2013.01); H01J 49/20 (2013.01); H01J 49/22 (2013.01); H01J 49/326 (2013.01); H01J 49/38 (2013.01); H01J 49/4205 (2013.01); H01J 49/4215 (2013.01); H05H 5/03 (2013.01); H05H 7/04 (2013.01); H05H 7/22 (2013.01); H05H 9/00 (2013.01); H05H 13/04 (2013.01);
Abstract

A mass analyzer includes a main substrate, an upper substrate adhered to the main substrate, and a lower substrate. A mass analysis room (cavity) is formed in the main substrate and penetrates from an upper surface of the first main substrate to a lower surface of the first main substrate. A vertical direction (Z direction) to the main substrate by the upper substrate, both sides of the lower substrate, a travelling direction (X direction) of charged particles and a right angle to the Z direction by the main substrate, and both sides of a right-angled direction (Y to Z direction) and the X direction by a side surface of the main substrate are surrounded. A central hole is open in the side plate of the main substrate that the charged particles enter. The charged particles enter the mass analysis room through the central hole formed in the first main substrate.


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