The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2020
Filed:
Sep. 18, 2019
Yoshitaka Sasaki, Los Gatos, CA (US);
Hiroyuki Ito, Milpitas, CA (US);
Kazuki Sato, Milpitas, CA (US);
Shigeki Tanemura, Milpitas, CA (US);
Hironori Araki, Milpitas, CA (US);
Yoji Nomura, Milpitas, CA (US);
Tetsuya Roppongi, Milpitas, CA (US);
Atsushi Yamaguchi, Milpitas, CA (US);
Yoshitaka Sasaki, Los Gatos, CA (US);
Hiroyuki Ito, Milpitas, CA (US);
Kazuki Sato, Milpitas, CA (US);
Shigeki Tanemura, Milpitas, CA (US);
Hironori Araki, Milpitas, CA (US);
Yoji Nomura, Milpitas, CA (US);
Tetsuya Roppongi, Milpitas, CA (US);
Atsushi Yamaguchi, Milpitas, CA (US);
HEADWAY TECHNOLOGIES, INC., Milpitas, CA (US);
Abstract
A manufacturing method for a magnetic head includes the steps of: forming a main pole; forming a spin torque oscillator; and forming a trailing shield. The step of forming the spin torque oscillator includes: a step of forming a layered film; a step of forming an interposition layer; a step of forming a mask; a first etching step of etching a portion of the interposition layer using the mask; a second etching step of etching a portion of the layered film using the mask and the interposition layer as an etching mask; a step of removing the interposition layer and the mask; and a patterning step of patterning the layered film into the spin torque oscillator.