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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10802401 B1

PDFFull Text
Date of Patent:
Oct. 13, 2020

Filed:

Sep. 26, 2016

Negative-type photosensitive resin composition, cured film, element and display apparatus that include cured film, production method for the same

Applicant:

Toray Industries, Inc., Tokyo, JP;

Inventors:

Yugo Tanigaki, Otsu, JP;

Satoshi Kamemoto, Otsu, JP;

Kazuto Miyoshi, Otsu, JP;

Assignee:

TORAY INDUSTRIES, INC., Tokyo, JP;

Attorney:

Birch, Stewart, Kolasch & Birch, LLP

Primary Examiner:

Martin J Angebranndt

Int. Cl.
CPC ...
G03F 7/027 (2006.01); G03F 7/028 (2006.01); G03F 7/037 (2006.01); G03F 7/033 (2006.01); H01L 51/56 (2006.01); H01L 51/54 (2006.01); C08F 265/06 (2006.01); C08F 283/12 (2006.01); C08F 283/04 (2006.01); C08G 73/22 (2006.01); C08G 73/10 (2006.01); C09D 179/08 (2006.01); C08F 222/10 (2006.01); G03F 7/038 (2006.01); C08F 285/00 (2006.01); G03F 7/032 (2006.01); C08L 51/00 (2006.01); G03F 7/004 (2006.01); C09K 11/06 (2006.01); G03F 7/105 (2006.01); H01L 51/50 (2006.01); G03F 7/075 (2006.01); G03F 7/20 (2006.01); H01L 51/52 (2006.01); H01L 27/32 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0387 (2013.01); C08F 265/06 (2013.01); C08F 283/04 (2013.01); C08F 283/12 (2013.01); C08F 285/00 (2013.01); C08G 73/106 (2013.01); C08G 73/1017 (2013.01); C08G 73/1039 (2013.01); C08G 73/1042 (2013.01); C08G 73/1067 (2013.01); C08G 73/1071 (2013.01); C08G 73/22 (2013.01); C08L 51/003 (2013.01); C09D 179/08 (2013.01); C09K 11/06 (2013.01); G03F 7/0046 (2013.01); G03F 7/028 (2013.01); G03F 7/032 (2013.01); G03F 7/033 (2013.01); G03F 7/037 (2013.01); G03F 7/0381 (2013.01); G03F 7/0382 (2013.01); G03F 7/0757 (2013.01); G03F 7/105 (2013.01); G03F 7/2014 (2013.01); G03F 7/2037 (2013.01); H01L 51/50 (2013.01); C09K 2211/1007 (2013.01); C09K 2211/1029 (2013.01); C09K 2211/185 (2013.01); H01L 27/3246 (2013.01); H01L 27/3258 (2013.01); H01L 51/5218 (2013.01); H01L 51/5284 (2013.01); H01L 2251/5338 (2013.01);
Abstract

To provide an alkaline developable negative-type photosensitive resin composition from which a cured film that has a high-resolution and low-taper pattern shape and that are excellent in heat resistance and light blocking property can be obtained. A negative-type photosensitive resin composition is characterized by containing an (A1) first resin, a (A2) second resin, a (C) photopolymerization initiator, and a (D) coloring agent, wherein the (A1) first resin is an (A1-1) polyimide and/or an (A1-2) polybenzo-oxazole, and wherein the (A2) second resin is one or more species selected from a (A2-1) polyimide precursor, a (A2-2) polybenzo-oxazole precursor, a (A2-3) polysiloxane, a (A2-4) cardo based resin, and an (A2-5) acrylic resin, and wherein a content ratio of the (A1) first resin in a total of 100 mass % of the (A1) first resin and the (A2) second resin is within the range of 25 to 90 mass %.

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