The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2020

Filed:

Apr. 14, 2016
Applicant:

Mitsubishi Heavy Industries, Ltd., Tokyo, JP;

Inventors:

Shingo Nishikata, Tokyo, JP;

Yoshikatsu Kuroda, Tokyo, JP;

Hiroshi Ikebuchi, Tokyo, JP;

Koichi Hamamoto, Tokyo, JP;

Tomoya Morioka, Tokyo, JP;

Atsushi Ochiai, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F41H 13/00 (2006.01); F41H 11/02 (2006.01); H05H 1/24 (2006.01); H01S 3/10 (2006.01); H01S 3/00 (2006.01);
U.S. Cl.
CPC ...
F41H 13/0093 (2013.01); F41H 11/02 (2013.01); F41H 13/005 (2013.01); H01S 3/00 (2013.01); H01S 3/10 (2013.01); H05H 1/24 (2013.01);
Abstract

A method of irradiating an electromagnetic pulse includes specifying a position of a target having electronic equipment; setting the light-condensing point based on the position of the target; and condensing the laser beam to generate plasma in the light-condensing point such that the electromagnetic pulse generated from the plasma is irradiated to the electronic equipment. In this way, a method and system for irradiating an electromagnetic pulse are realized which can irradiate the electromagnetic pulse of a large output while restraining diffusion of the electromagnetic pulse.


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