The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2020

Filed:

Dec. 20, 2016
Applicant:

Landmark Graphics Corporation, Houston, TX (US);

Inventors:

Robello Samuel, Cypress, TX (US);

Zhengchun Liu, Sugar Land, TX (US);

Jeffrey Marc Yarus, Houston, TX (US);

Jin Fei, Houston, TX (US);

Assignee:

LANDMARK GRAPHICS CORPORATION, Houston, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
E21B 44/02 (2006.01); E21B 47/022 (2012.01); E21B 7/04 (2006.01); G06F 19/00 (2018.01);
U.S. Cl.
CPC ...
E21B 44/02 (2013.01); E21B 7/046 (2013.01); E21B 47/022 (2013.01); G06F 19/00 (2013.01);
Abstract

A method may include drilling a deviated wellbore penetrating a subterranean formation according to bottom hole assembly parameters and surface parameters; collecting real-time formation data during drilling; updating a model of the subterranean formation based on the real-time formation data and deriving formation properties therefrom; collecting survey data corresponding to a location of a drill bit in the subterranean formation; deriving a target well path for the drilling based on the model of the subterranean formation; deriving a series of trajectory well paths based on the formation properties, the survey data, the bottom hole assembly parameters, and the surface parameters and uncertainties associated therewith; deriving an actual well path based on the series of trajectory well paths; deriving a deviation between the target well path and the actual well path; and adjusting the bottom hole assembly parameters and the surface parameters to maintain the deviation below a threshold.


Find Patent Forward Citations

Loading…