The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2020
Filed:
Nov. 18, 2016
Basf SE, Ludwigshafen am Rhein, DE;
Torben Adermann, Ludwigshafen, DE;
Daniel Loeffler, Ludwigshafen, DE;
Carolin Limburg, Ludwigshafen, DE;
Falko Abels, Ludwigshafen, DE;
Hagen Wilmer, Ludwigshafen, DE;
Monica Gill, Charlottetown, CA;
Matthew Griffiths, Ottawa, CA;
Sean Barry, Ottawa, CA;
BASF SE, Ludwigshafen am Rhein, DE;
Abstract
The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. The present invention relates to a process comprising bringing a compound of general formula (I) into the gaseous or aerosol state and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein R, R, R, and Rare independent of each other an alkyl group, an aryl group or a trialkylsilyl group, M is Mn, Ni or Co, X is a ligand which coordinates M, wherein at least one X is a neutrally charged ligand, m is 1, 2 or 3 and n is at least 1 wherein the molecular weight of the compound of general formula (I) is up to 1000 g/mol.