The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2020
Filed:
Mar. 23, 2016
Applicant:
Cockerill Maintenance & Ingenierie S.a., Seraing, BE;
Inventor:
Michel Dubois, Boncelles, BE;
Assignee:
COCKERILL MAINTENANCE & INGENIERIE S.A., Seraing, BE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C21D 9/56 (2006.01); C21D 9/00 (2006.01); F27B 9/04 (2006.01); F27D 7/06 (2006.01); F27B 9/14 (2006.01); F27B 9/28 (2006.01); F27B 9/36 (2006.01); F27D 99/00 (2010.01);
U.S. Cl.
CPC ...
C21D 9/561 (2013.01); C21D 9/005 (2013.01); C21D 9/56 (2013.01); C21D 9/562 (2013.01); F27B 9/04 (2013.01); F27B 9/045 (2013.01); F27B 9/14 (2013.01); F27D 7/06 (2013.01); F27B 9/28 (2013.01); F27B 9/36 (2013.01); F27D 99/0073 (2013.01);
Abstract
A continuous annealing furnace for annealing steel strips has a reaction chamber wherein the steel strips are transported vertically, the reaction chamber having openings supplied with a reactant, also called reactant openings, located at the top or at the bottom of the reaction chamber, wherein the reaction chamber further has other openings supplied with an inert gas, also called inert gas openings, the inert gas openings being located on the lateral sides of the reaction chamber.