The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2020

Filed:

Oct. 23, 2019
Applicant:

Microjet Technology Co., Ltd., Hsinchu, TW;

Inventors:

Hao-Jan Mou, Hsinchu, TW;

Rong-Ho Yu, Hsinchu, TW;

Cheng-Ming Chang, Hsinchu, TW;

Hsien-Chung Tai, Hsinchu, TW;

Wen-Hsiung Liao, Hsinchu, TW;

Chi-Feng Huang, Hsinchu, TW;

Yung-Lung Han, Hsinchu, TW;

Chang-Yen Tsai, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F04B 19/00 (2006.01); F04B 37/00 (2006.01); B82Y 40/00 (2011.01); H01L 29/04 (2006.01); B81C 1/00 (2006.01); F16K 99/00 (2006.01);
U.S. Cl.
CPC ...
B81C 1/00071 (2013.01); B81C 1/00119 (2013.01); B81C 1/00166 (2013.01); B81C 1/00492 (2013.01); F16K 99/0048 (2013.01);
Abstract

A manufacturing method of micro channel structure is disclosed and includes steps of: providing a substrate; depositing and etching to form a first insulation layer; depositing and etching to form a supporting layer; depositing and etching to form a valve layer; depositing and etching to form a second insulation layer; depositing and etching to form a vibration layer, a lower electrode layer and a piezoelectric actuating layer; providing a photoresist layer and depositing and etching to form a plurality of bonding pads; depositing and etching to from a mask layer; etching to form a first chamber; and etching to form a second chamber.


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