The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 06, 2020

Filed:

Nov. 16, 2018
Applicant:

Murata Manufacturing Co., Ltd., Nagaokakyo-shi, Kyoto-fu, JP;

Inventors:

Masaki Takeuchi, Nagaokakyo, JP;

Shigeki Nishiyama, Nagaokakyo, JP;

Hiroshi Nakagawa, Nagaokakyo, JP;

Satoru Goto, Nagaokakyo, JP;

Yoshinari Nakamura, Nagaokakyo, JP;

Assignee:

MURATA MANUFACTURING CO., LTD., Nagaokakyo-Shi, Kyoto-Fu, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/94 (2006.01); H01L 21/822 (2006.01); H01L 49/02 (2006.01); H01L 27/08 (2006.01); H01L 23/60 (2006.01); H01L 29/06 (2006.01);
U.S. Cl.
CPC ...
H01L 29/945 (2013.01); H01L 21/822 (2013.01); H01L 23/60 (2013.01); H01L 27/0805 (2013.01); H01L 28/90 (2013.01); H01L 29/0607 (2013.01);
Abstract

A capacitor that includes a substrate; a capacitor formation region in which one or more trenches are formed; a dummy region located between the capacitor formation region and an end of the substrate; a first electrode formed inside the one or more trenches to cover the capacitor formation region, and a dielectric film; a second electrode that covers the capacitor formation region and has a different potential from the first electrode; and an extended portion that formed in the dummy region. Moreover, the extended portion forms a recess or a protrusion on the substrate in a path from the second electrode to the end portion of the substrate.


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