The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2020
Filed:
Sep. 24, 2018
Arm Limited, Cambridge, GB;
Paul de Dood, Pleasanton, CA (US);
Marlin Wayne Frederick, Jr., Austin, TX (US);
Jerry Chaoyuan Wang, Fremont, CA (US);
Brian Tracy Cline, Austin, TX (US);
Xiaoqing Xu, Austin, TX (US);
Andy Wangkun Chen, Austin, TX (US);
Yew Keong Chong, Austin, TX (US);
Tom Shore, Austin, TX (US);
Sriram Thyagarajan, Austin, TX (US);
Gus Yeung, Austin, TX (US);
Daniel J. Albers, Beaver, PA (US);
David William Granda, Austin, TX (US);
Arm Limited, Cambridge, GB;
Abstract
A computer implemented system and method is provided for generating a layout of the cell defining a circuit component, the layout providing a layout pattern for a target process technology. The method comprises obtaining an archetype layout providing a valid layout pattern for the cell having regard to design rules of the target process technology, and receiving an input data file providing a process technology independent schematic of the circuit component for which the cell is to be generated. A schematic sizing operation is then performed on the input data file, having regard to both schematic constraints applicable to the target process technology and layout constraints derived from the archetype layout, in order to generate an output data file providing a process technology dependent schematic of the circuit component. A cell generation operation is then performed using the output data file and layout data determined from the archetype layout in order to generate the layout of the cell. Such an approach enables both the schematic and layout to be co-optimised during generation of the layout of the cell.