The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2020
Filed:
Oct. 29, 2014
Paradigm Sciences Ltd., Grand Cayman, KY;
Jean-Claude Dulac, Sugarland, TX (US);
Wan-Chiu Li, Nancy, FR;
EMERSON PARADIGM HOLDING LLC, Houston, TX (US);
Abstract
A system and method for modeling a geological structure may include, in an initial model, computing a first function for a geological structure including a first set of iso-surfaces. A processor may detect if the first set of iso-surfaces intersect a set of geological markers within a threshold proximity. If not, the initial model may be corrected using an induced mesh having an increased cell resolution compare to the initial model for computing a second function for the geological structure including a second set of iso-surfaces that intersect the geological markers within the threshold proximity. A processor may insert the second set of iso-surfaces into a second model to locally increase its resolution relative to the initial model by dividing cells in the second model along the second set of iso-surfaces. For each new geological structure, the above steps may be repeated using the second model as the initial model.