The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10794879 B1

Date of Patent:

Oct. 06, 2020

Filed:

Aug. 07, 2019

Gc-tof ms with improved detection limit

Applicant:

Leco Corporation, St. Joseph, MI (US);

Inventor:

Anatoly N. Verenchikov, St. Petersburg, RU;

Assignee:

LECO Corporation, St. Joseph, MI (US);

Attorney:

Honigman LLP

Primary Examiner:

Nicole M Ippolito

Int. Cl.

CPC ...

G01N 30/72 (2006.01); H01J 49/40 (2006.01); H01J 49/06 (2006.01); H01J 49/00 (2006.01); H01J 49/10 (2006.01); H01J 49/14 (2006.01);

U.S. Cl.

CPC ...

G01N 30/7206 (2013.01); H01J 49/004 (2013.01); H01J 49/0031 (2013.01); H01J 49/061 (2013.01); H01J 49/067 (2013.01); H01J 49/10 (2013.01); H01J 49/147 (2013.01); H01J 49/406 (2013.01);

Abstract

For improving sensitivity, dynamic range, and specificity of GC-MS analysis there are disclosed embodiments of novel apparatuses based on improved characteristics of semi-open source with electron impact ionization, providing much higher brightness compared to known open EI sources. In an implementation, the source becomes compatible with multi-reflecting TOF analyzers for higher resolution analysis for improving detection limit. With improved schemes of spatial and temporal refocusing there are proposed various tandem TOF-TOF spectrometers with PSD, CID, and SID fragmentation and using either singly reflecting TOF or MR-TOF analyzers.

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