The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 06, 2020

Filed:

Sep. 10, 2012
Applicants:

Marcel Simor, Zoetermeer, NL;

Ales Fiala, Rotterdam, NL;

Inventors:

Marcel Simor, Zoetermeer, NL;

Ales Fiala, Rotterdam, NL;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H05H 1/24 (2006.01); C23C 16/50 (2006.01); H01J 37/32 (2006.01); C23C 16/54 (2006.01); D06M 10/10 (2006.01); D06M 14/18 (2006.01); D06M 10/02 (2006.01); D06M 11/36 (2006.01); D06M 11/83 (2006.01); B05D 1/00 (2006.01); D06M 23/08 (2006.01);
U.S. Cl.
CPC ...
D06M 10/10 (2013.01); B05D 1/62 (2013.01); D06M 10/025 (2013.01); D06M 11/36 (2013.01); D06M 11/83 (2013.01); D06M 14/18 (2013.01); D06M 23/08 (2013.01); H05H 1/2406 (2013.01); C23C 16/50 (2013.01); C23C 16/545 (2013.01); H01J 37/3277 (2013.01); H01J 37/32348 (2013.01); H01J 37/32752 (2013.01); H01J 37/32761 (2013.01); H05H 2001/2412 (2013.01);
Abstract

An apparatus for depositing a polymer layer containing nanomaterial on a substrate material includes a carrier for carrying the substrate material; a transport structure for providing a polymerization material near a surface of the substrate material and conducting a gas flow near the surface of the substrate material with the gas flow comprising a nanomaterial; and a plasma chamber wherein a plasma electrode structure is arranged for depositing the polymer layer containing nanomaterial on the surface of the substrate material by applying a plasma polymerization process.


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