The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2020
Filed:
Aug. 03, 2018
Applicant:
Arkema France, Colombes, FR;
Inventors:
Guillaume Le, HĂ©rouville-Saint-Clair, FR;
Julien Jouanneau, Corneville-sur-Risle, FR;
Assignee:
ARKEMA FRANCE, Colombes, FR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C 45/46 (2006.01); C07C 49/784 (2006.01); C08G 61/12 (2006.01); C08G 65/00 (2006.01); C08K 3/16 (2006.01);
U.S. Cl.
CPC ...
C08G 61/127 (2013.01); C07C 45/46 (2013.01); C07C 49/784 (2013.01); C08G 65/00 (2013.01); C08K 3/16 (2013.01); C08G 2261/3442 (2013.01); C08G 2261/375 (2013.01); C08G 2261/45 (2013.01); C08G 2261/712 (2013.01); C08G 2650/40 (2013.01); C08K 2003/164 (2013.01);
Abstract
A method for the manufacture of polyether ketone ketone (PEKK), including: Further, a composition including at least 40 wt. % of 1,4-bis(4-phenoxybenzoyl)benzene-Lewis acid complex and an anhydrous aprotic solvent or solvent mixture, characterized in that it includes less than 1 wt. %, preferably less than 0.5 wt. % and in particular less than 0.1 wt. % of molecules including xanthydrol groups and its use for the manufacture of polyether ketone ketone.