The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 06, 2020

Filed:

Nov. 22, 2019
Applicant:

Toppan Printing Co., Ltd., Tokyo, JP;

Inventors:

Hidetaka Ide, Tokyo, JP;

Naoki Minamikawa, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B42D 25/328 (2014.01); B42D 25/387 (2014.01); B42D 25/455 (2014.01); B42D 25/46 (2014.01); B42D 25/47 (2014.01); B42D 25/435 (2014.01); G02B 5/18 (2006.01); G06F 3/02 (2006.01);
U.S. Cl.
CPC ...
B42D 25/328 (2014.10); B42D 25/387 (2014.10); B42D 25/455 (2014.10); B42D 25/46 (2014.10); B42D 25/47 (2014.10);
Abstract

An information recording medium is formed by laminating a transparent protective layer and a base material having laser color-developing properties. The information recording medium includes an intermediate layer that is disposed between the transparent protective layer and the base material. In the information recording medium, the intermediate layer includes a diffraction structure layer that has a diffraction structure, and a first reflective layer that reflects visible light and is destroyed when irradiated with a laser beam. Light, when incident from a transparent protective layer side, causes a diffracted light pattern to appear in the diffraction structure layer so as to be observable from the transparent protective layer side. A laser beam, when applied from the transparent protective layer side, passes through the diffraction structure layer, destroys the first reflective layer, and develops color in the base material.


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