The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 06, 2020

Filed:

May. 11, 2017
Applicant:

Konica Minolta, Inc., Tokyo, JP;

Inventor:

Hideyuki Eguchi, Hachioji, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J 2/14 (2006.01); H01L 41/187 (2006.01); B41J 2/16 (2006.01); H01L 41/09 (2006.01); H01L 41/316 (2013.01); H01L 41/332 (2013.01);
U.S. Cl.
CPC ...
B41J 2/14201 (2013.01); B41J 2/161 (2013.01); B41J 2/1623 (2013.01); B41J 2/1628 (2013.01); B41J 2/1631 (2013.01); B41J 2/1632 (2013.01); B41J 2/1642 (2013.01); B41J 2/1645 (2013.01); B41J 2/1646 (2013.01); H01L 41/0973 (2013.01); H01L 41/1876 (2013.01); H01L 41/316 (2013.01); H01L 41/332 (2013.01); B41J 2202/03 (2013.01);
Abstract

A method for manufacturing a piezoelectric actuator () as a piezoelectric element includes: an electrode forming step of forming a lower electrode () on a base body () including at least a support substrate (); a film forming step of forming a piezoelectric thin film () on the lower electrode (); a patterning step of patterning the piezoelectric thin film (25) by removing a part of the piezoelectric thin film (25); and a polishing step of polishing the support substrate (). The polishing step is performed before the patterning step. In the film forming step, the piezoelectric thin film () is formed such that a ratio of the peak intensity of a pyrochlore phase to the sum of the peak intensities of (100) orientation, (110) orientation, and (111) orientation of a perovskite phase, obtained by 2θ/θ measurement of X-ray diffraction, is 100 ppm or less.


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