The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 06, 2020

Filed:

Feb. 27, 2015
Applicant:

Selfrag Ag, Kerzers, CH;

Inventors:

Reinhard Müller-Siebert, Bern, CH;

Joel Kolly, Corminboeuf, CH;

Assignee:

selFrag AG, Kerzers, CH;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B02C 19/18 (2006.01); B02C 23/12 (2006.01); B02C 23/36 (2006.01);
U.S. Cl.
CPC ...
B02C 19/18 (2013.01); B02C 23/12 (2013.01); B02C 23/36 (2013.01); B02C 2019/183 (2013.01);
Abstract

A method for fragmenting and/or weakening of pourable material by means of high-voltage discharges is disclosed. Thereby, a material flow of the pourable material is, immersed in a process liquid, guided past a high-voltage electrode assembly with one or more high-voltage electrodes, while high-voltage punctures through the material are produced by means of charging of the high-voltage electrodes with high-voltage pulses. The zone of the material flow in which the high-voltage punctures through the material are produced is delimited laterally by substantially unmoved zones of the same material as viewed in a guiding-past direction. With the disclosed method, it becomes possible to fragment and/or weaken pourable material in a continuous process by means of high-voltage punctures in a low-wear and low-contamination manner.


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