The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2020
Filed:
Dec. 16, 2016
Koninklijke Philips N.v., Eindhoven, NL;
Nicole Schadewaldt, Norderstedt, DE;
Jochen Peters, Norderstedt, DE;
KONINKLIJKE PHILIPS N.V., Eindhoven, NL;
Abstract
It is an object of the invention to provide for an improved radiation treatment. According to a first aspect of the invention, this object is achieved by a method for determining a patient specific locally varying margin on a treatment target and/or an organ at risk in order to compensate for local intrafraction motion expected during a radiotherapy fraction to be delivered over a radiotherapy fraction time interval. The patient specific locally varying margin is determined based on a displacement and/or an estimate of the displacement of at least a first location and a second location on the treatment target and/or organ at risk. The method comprises steps of: acquiring a first medical image of the treatment target and/or the organ at risk and acquiring a second medical image of the treatment target and/or the organ at risk, wherein the time between the acquisition of the first medical image and the second medical image is similar to the radiotherapy fraction time interval and determining of positions of the first location and the second location in the first medical image and in the second medical image and using the determined positions for determining the patient specific locally varying margin around the treatment target and/or organ at risk.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile