The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 06, 2020

Filed:

Dec. 09, 2015
Applicant:

The Charles Stark Draper Laboratory, Inc., Cambridge, MA (US);

Inventors:

David J. Carter, Concord, MA (US);

Tirunelveli S. Sriram, Acton, MA (US);

Parshant Kumar, Stoneham, MA (US);

Clayton Morris, Norfolk, MA (US);

William W. McFarland, Waltham, MA (US);

Eugene H. Cook, Acton, MA (US);

John LeBlanc, North Andover, MA (US);

Alla Gimbel, Medford, MA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A41D 19/015 (2006.01); B29C 45/37 (2006.01); B29C 33/42 (2006.01); B29C 37/00 (2006.01); B29C 39/02 (2006.01); B29C 39/10 (2006.01); B29D 99/00 (2010.01); B29C 33/38 (2006.01); B29C 33/58 (2006.01); B29C 39/26 (2006.01); B29L 31/48 (2006.01); B29C 59/02 (2006.01); B29K 75/00 (2006.01); B29K 105/00 (2006.01);
U.S. Cl.
CPC ...
A41D 19/01564 (2013.01); B29C 33/3842 (2013.01); B29C 33/424 (2013.01); B29C 33/58 (2013.01); B29C 37/0053 (2013.01); B29C 39/026 (2013.01); B29C 39/10 (2013.01); B29C 39/26 (2013.01); B29C 45/372 (2013.01); B29D 99/0067 (2013.01); B29C 2059/023 (2013.01); B29K 2075/00 (2013.01); B29K 2105/0097 (2013.01); B29K 2863/00 (2013.01); B29K 2891/00 (2013.01); B29L 2031/4864 (2013.01);
Abstract

A mold for casting a micro-scale structure includes an upper surface including a first cavity having a first depth. A negative pattern for an array of micro-scale structures is defined in a surface of the first cavity. The mold includes at least one second cavity having a second depth defined in the cavity outside of the negative pattern for the array of micro-scale structures. The at least one second cavity defines a negative pattern for a standoff of the micro-scale structure. A fabric retaining frame is disposed in the first cavity.


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