The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 29, 2020

Filed:

Sep. 19, 2019
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Chih-Hsun Hsu, Campbell, CA (US);

Tza-Jing Gung, San Jose, CA (US);

Benjamin Schwarz, San Jose, CA (US);

Shahid Rauf, Pleasanton, CA (US);

Ankur Agarwal, Mountain View, CA (US);

Vijay D. Parkhe, San Jose, CA (US);

Michael D. Willwerth, Campbell, CA (US);

Zhiqiang Guo, Sunnyvale, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/683 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01L 21/6833 (2013.01); H01J 37/3266 (2013.01); H01J 37/32715 (2013.01);
Abstract

Electrostatic chucks with variable pixelated magnetic field are described. For example, an electrostatic chuck (ESC) includes a ceramic plate having a front surface and a back surface, the front surface for supporting a wafer or substrate. A base is coupled to the back surface of the ceramic plate. A plurality of electromagnets is disposed in the base, the plurality of electromagnets configured to provide pixelated magnetic field tuning capability for the ESC.


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