The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 2020
Filed:
Jan. 10, 2018
Applicant:
Screen Holdings Co., Ltd., Kyoto, JP;
Inventors:
Naoyuki Osada, Kyoto, JP;
Koji Hashimoto, Kyoto, JP;
Assignee:
SCREEN Holdings Co., Ltd., , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); B08B 1/04 (2006.01); H01L 21/306 (2006.01); H01L 21/304 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
H01L 21/6708 (2013.01); B08B 1/04 (2013.01); H01L 21/027 (2013.01); H01L 21/304 (2013.01); H01L 21/306 (2013.01); H01L 21/67017 (2013.01); H01L 21/67028 (2013.01); H01L 21/67051 (2013.01); H01L 21/67109 (2013.01); H01L 21/67248 (2013.01);
Abstract
A discharge portis arranged inside a chamber. A circulation flow passagecirculates a processing liquid, while maintaining the processing liquid at a predetermined temperature. A discharge flow passageis branched from a circulation flow passageto guide the processing liquid to the discharge port. A return flow passageis connected to the discharge flow passageinside the chamberand allows the processing liquid running through the discharge flowpassageto flow back to the circulation flow passage