The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 2020
Filed:
Aug. 02, 2016
Nec Corporation, Minato-ku, Tokyo, JP;
Takazumi Kawai, Tokyo, JP;
Katsuhiro Ochiai, Tokyo, JP;
NEC CORPORATION, Tokyo, JP;
Abstract
Provided is a manufacturing process analysis device (), comprising: a computation unit () which computes, in a process in which a manufactured object is manufactured, invariant compliance strengths for each shift time for manufacturing condition values () and quality values () which are measured in time series; a shift time specification unit () which derives, as a specified shift time, a shift time for which the invariant compliance strengths satisfy a baseline; and an analysis unit () which analyzes the state of the manufacturing process on the basis of the quality value and the manufacturing condition value for the time which is earlier by the specified shift time than the time at which the quality value is measured.