The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 29, 2020

Filed:

Jul. 25, 2018
Applicants:

Hubei University of Technology, Wuhan, Hubei, CN;

Tsinghua University, Beijing, CN;

Inventors:

Songling Huang, Beijing, CN;

Xiaochun Song, Hubei, CN;

Lisha Peng, Beijing, CN;

Wei Zhao, Beijing, CN;

Shen Wang, Beijing, CN;

Xinjie Yu, Beijing, CN;

Shisong Li, Beijing, CN;

Assignees:

HUBEI UNIVERSITY OF TECHNOLOGY, Wuhan, Hubei, CN;

TSINGHUA UNIVERSITY, Beijing, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 27/83 (2006.01);
U.S. Cl.
CPC ...
G01N 27/83 (2013.01);
Abstract

A method for identifying a defect opening profile includes: acquiring a vertical component of a magnetic flux leakage signal of a defect; identifying right-angle features and corresponding right-angle position points of the defect from the vertical component; obtaining all possible right-angle types at each right-angle position point of the defect according to the corresponding right-angle feature of the vertical component; traversing all the possible right-angle types at each right-angle position point to determine respective optimal right-angle type at each right-angle position point; and drawing the defect opening profile according to the respective optimal right-angle type at each right-angle position point.


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