The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 2020
Filed:
Dec. 27, 2017
Applicant:
Hanwha Chemical Corporation, Seoul, KR;
Inventors:
Hee Dong Lee, Seoul, KR;
Ji Ho Kim, Suncheon-si, KR;
Sung Eun Park, Yeosu-si, KR;
Hyo Jin Jeon, Seoul, KR;
Assignee:
HANWHA CHEMICAL CORPORATION, Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/24 (2006.01); C01B 33/035 (2006.01); B01J 19/00 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23C 16/24 (2013.01); B01J 19/002 (2013.01); C01B 33/035 (2013.01); C23C 16/45563 (2013.01);
Abstract
A polysilicon manufacturing apparatus according to an exemplary embodiment of the present invention includes: a reactor in which a reactive gas is introduced to perform a polysilicon manufacturing process by a chemical vapor deposition (CVD) method; and a slit-type nozzle installed at the reactor and spraying a gas inside the reactor to prevent absorption of silicon particles during a process.