The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 29, 2020

Filed:

Aug. 10, 2018
Applicant:

Reichert, Inc., Depew, NY (US);

Inventors:

David L. Beverly, Alden, NY (US);

Russell J. Bonaventura, Williamsville, NY (US);

Assignee:

Reichert, Inc., Depew, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61B 3/103 (2006.01); A61B 3/107 (2006.01); A61B 3/16 (2006.01); A61B 3/00 (2006.01);
U.S. Cl.
CPC ...
A61B 3/103 (2013.01); A61B 3/0016 (2013.01); A61B 3/107 (2013.01); A61B 3/165 (2013.01);
Abstract

An ophthalmic instrument includes a carrier positionable relative to a test subject, and first and second measurement units mounted on the carrier by corresponding first and second parallelogram linkages. The first measurement unit, for example an autorefractor/keratometer, performs a first type of ophthalmic measurement, and is guided by the first parallelogram linkage to move relative to the carrier simultaneously in forward and downward directions from an idle position to a measurement position. The second measurement unit, for example a tonometer, performs a second type of ophthalmic measurement, and is guided by the second parallelogram linkage to move relative to the carrier simultaneously in forward and upward directions from an idle position to a measurement position. The first and second measurement units may each have a respective optical axis which aligns with a fixed measurement axis of the carrier when the measurement unit is in its measurement position.


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