The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2020
Filed:
Dec. 19, 2018
International Business Machines Corporation, Armonk, NY (US);
Emanuel Loertscher, Bonstetten, CH;
Andrea Giovannini, Zurich, CH;
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method for generating extreme ultraviolet (EUV) radiation employs an EUV apparatus, which comprises one or more sets of nanoscale antennas, designed for electromagnetic field enhancement. The one or more sets comprise, each, at least one pair of opposite antennas separated by a feedgap volume. First cations of same molecular entities are allowed to reach the feedgap volumes and the antennas are energized so as to perform one or more EUV radiation emission cycles, during which the first cations are further ionized via electromagnetic field intensities achieved in the feedgap volumes by optically exciting corresponding pairs of opposite antennas. Second cations are thus obtained, which have a higher charge state than the first cations, and are forced to radiatively decay, by electrically stimulating antenna pairs, whereby EUV radiation is generated and third cations are obtained, which have a lower charge state than the second cations.