The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 22, 2020

Filed:

May. 29, 2019
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;

Inventors:

Joo-Heon Kang, Seoul, KR;

Bongtae Park, Seoul, KR;

Jae-Joo Shim, Suwon-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/11582 (2017.01); H01L 27/11524 (2017.01); H01L 27/11556 (2017.01); H01L 21/02 (2006.01); H01L 21/311 (2006.01); H01L 27/1157 (2017.01);
U.S. Cl.
CPC ...
H01L 27/11582 (2013.01); H01L 21/02063 (2013.01); H01L 21/31116 (2013.01); H01L 21/31144 (2013.01); H01L 27/1157 (2013.01); H01L 27/11524 (2013.01); H01L 27/11556 (2013.01);
Abstract

A 3D semiconductor memory device includes an electrode structure on a substrate, the electrode structure including gate electrodes stacked in a first direction perpendicular to a top surface of the substrate, a vertical semiconductor pattern penetrating the electrode structure and connected to the substrate, and a data storage pattern between the electrode structure and the vertical semiconductor pattern. The data storage pattern includes first, second and third insulating patterns sequentially stacked. Each of the first to third insulating patterns includes a horizontal portion extending in a second direction parallel to the top surface of the substrate. The horizontal portions of the first, second and third insulating patterns are sequentially stacked in the first direction. At least one of the horizontal portions of the first and third insulating patterns protrudes beyond a sidewall of the horizontal portion of the second insulating pattern in the second direction.


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