The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 22, 2020

Filed:

Oct. 19, 2017
Applicant:

Excillum Ab, Kista, SE;

Inventors:

Tomi Tuohimaa, Kista, SE;

Per Takman, Kista, SE;

Andrii Sofiienko, Kista, SE;

Assignee:

EXCILLUM AB, Kista, SE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 35/08 (2006.01); H01J 35/30 (2006.01); H01J 35/14 (2006.01); H01J 35/18 (2006.01); H05G 1/52 (2006.01);
U.S. Cl.
CPC ...
H01J 35/30 (2013.01); H01J 35/08 (2013.01); H01J 35/14 (2013.01); H01J 35/186 (2019.05); H05G 1/52 (2013.01); H01J 35/116 (2019.05);
Abstract

A system and method for generating X-ray radiation. The system includes an electron source operable to generate an electron beam and an X-ray target for generating X-ray radiation upon interaction with the electron beam. The method includes moving the electron beam over an edge separating a first region and a second region of the X-ray target, wherein the first region and the second region have different capability to generate X-ray radiation upon interaction with the electron beam. The system allows for a lateral extension of the electron beam to be determined based on a change in a quantity indicative of the interaction between the electron beam and the first region and between the electron beam and the second region, and the movement of the electron beam.


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