The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2020
Filed:
Oct. 11, 2017
Applicant:
Stmicroelectronics SA, Montrouge, FR;
Inventors:
Folly Eli Ayi-Yovo, Grenoble, FR;
Cédric Durand, La Terrasse, FR;
Frédéric Gianesello, Saint Alban Leysse, FR;
Assignee:
STMICROELECTRONICS SA, Montrouge, FR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F21V 8/00 (2006.01); G02B 6/02 (2006.01); G02B 6/36 (2006.01); G02B 6/30 (2006.01); B23K 26/00 (2014.01); B23K 26/364 (2014.01); B23K 26/402 (2014.01); B23K 26/0622 (2014.01); G02B 6/12 (2006.01); B23K 103/00 (2006.01);
U.S. Cl.
CPC ...
G02B 6/0065 (2013.01); B23K 26/00 (2013.01); B23K 26/0624 (2015.10); B23K 26/364 (2015.10); B23K 26/402 (2013.01); G02B 6/02152 (2013.01); G02B 6/12004 (2013.01); G02B 6/30 (2013.01); G02B 6/3652 (2013.01); B23K 2103/54 (2018.08); G02B 2006/12176 (2013.01);
Abstract
The present invention relates to a method for manufacturing an optical device comprising forming a first trench in a glass plate and a second trench perpendicular to the first trench, wherein the first trench has an end opening into the second trench. The trenches are treated with hydrofluoric acid. The first trench is filled with a material to form a waveguide, and a mirror is formed on the wall of the second trench opposite the waveguide. An encapsulation layer is deposited over the glass plate, waveguide and second trench.