The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2020
Filed:
Jul. 19, 2018
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Inventors:
Assignee:
Samsung Electronics Co., Ltd., Suwon-Si, Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/2251 (2018.01); G06T 7/00 (2017.01); H01J 37/28 (2006.01); G03F 1/86 (2012.01); H01L 21/67 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
G01N 23/2251 (2013.01); G03F 1/86 (2013.01); G06T 7/0004 (2013.01); H01J 37/28 (2013.01); G01N 2223/3302 (2013.01); G01N 2223/3308 (2013.01); G01N 2223/401 (2013.01); G01N 2223/426 (2013.01); G01N 2223/507 (2013.01); G01N 2223/646 (2013.01); G06T 2207/30148 (2013.01); H01L 21/67288 (2013.01); H01L 22/12 (2013.01);
Abstract
In a method of detecting a defect, a region of a substrate may be primarily scanned using a first electron beam to detect a first defect. A remaining region of the substrate, which may be defined by excluding a portion in which the first defect may be positioned from the region of the substrate, may be secondarily scanned using a second electron beam to detect a second defect. Thus, the portion with the defect may not be scanned in a following scan process so that a scanning time may be remarkably decreased.