The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2020
Filed:
Apr. 12, 2019
Malvern Panalytical B.v., Almelo, NL;
Milen Gateshki, Almelo, NL;
Detlef Beckers, Almelo, NL;
MALVERN PANALYTICAL B.V., Almelo, NL;
Abstract
An X-ray analysis apparatus and method. The apparatus comprises an adjustable slit () between an X-ray source () and a sample (); and optionally a further slit (). A controller () is configured to control a width of the adjustable slit, between a first width, a larger second width, and an even larger third width. At the first and second widths: the adjustable slit () limits the divergence of the incident beam and thereby limits an area of the sample that is irradiated; and the further slit () does not limit the divergence of the incident beam. At the third width: the adjustable slit () does not limit the divergence of the incident beam, and the further slit () limits the divergence of the incident beam and thereby limits the area of the sample that is irradiated. Alternatively, at the third width, the adjustable slit () continues to limit the area irradiated.