The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2020
Filed:
Jul. 02, 2015
Nanotech Analysis S.r.l., Turin, IT;
Gianpiero Mensa, Turin, IT;
Raffaele Correale, Turin, IT;
Nanotech Analysis S.R.L., Turin, IT;
Abstract
Disclosed are devices, systems and methods for gas sampling, for controlling and measuring a gaseous flow, and for controlling a pressure gradient. An exemplary devicefor controlling a gaseous flow comprises a gaseous flow adjusting interface, configured to inhibit or allow a flow of gas through the devicein a controlled manner, and control meansof the adjusting interface. The adjusting interfacecomprises a plurality of nano-holes. Each of the nano-holes has sub-micrometric dimensions and is suitable to be opened or closed in a controlled manner. The control means, in turn, comprise actuating means, suitable to open or close these nano-holes, and electronic processing means, configured to activate the actuation means to open or close individually or collectively the nano-holesin a controlled manner.