The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 22, 2020

Filed:

Sep. 27, 2018
Applicant:

United States of America As Represented BY the Administrator of Nasa, Washington, DC (US);

Inventor:

Vivek H. Dwivedi, Glenn Dale, MD (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/40 (2006.01); C23C 16/455 (2006.01); C09C 3/06 (2006.01); C23C 16/44 (2006.01); C23C 16/56 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45555 (2013.01); C09C 3/063 (2013.01); C23C 16/405 (2013.01); C23C 16/4417 (2013.01); C23C 16/45527 (2013.01); C23C 16/45544 (2013.01); C23C 16/45553 (2013.01); C23C 16/56 (2013.01);
Abstract

Modification of pigments may be performed using atomic layer deposition (ALD) to provide custom-tailored thermal protection characteristics. More specifically, ALD may be used to encapsulate pigment particles with controlled thicknesses of a thermal protective layer, such as VO. ALD may allow films to be theoretically grown one atom at a time, providing angstrom-level thickness control.


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Dwivedi, Vivek. (2020). Modification of radiator pigments using atomic layer deposition (ald) of thermal protective film material (U.S. Patent No. 10781517). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10781517

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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