The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 22, 2020

Filed:

Jul. 02, 2018
Applicants:

Ivoclar Vivadent Ag, Schaan, LI;

Technische Universität Wien, Vienna, AT;

Inventors:

Norbert Moszner, Trieseen, CH;

Jörg Angermann, Sargans, CH;

Urs Karl Fischer, Arbon, CH;

Iris Lamparth, Grabs, CH;

Yohann Catel, Rans, CH;

Robert Liska, Schleinbach, AT;

Assignees:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
A61K 6/083 (2006.01); C07F 7/18 (2006.01); C08G 77/28 (2006.01); C08L 83/08 (2006.01); C08G 77/20 (2006.01); C08K 9/06 (2006.01); A61K 6/853 (2020.01); A61K 6/887 (2020.01); C08F 230/08 (2006.01); C09C 1/30 (2006.01); C09C 3/12 (2006.01);
U.S. Cl.
CPC ...
C07F 7/1804 (2013.01); A61K 6/853 (2020.01); A61K 6/887 (2020.01); C07F 7/1892 (2013.01); C08F 230/08 (2013.01); C08G 77/20 (2013.01); C08G 77/28 (2013.01); C08K 9/06 (2013.01); C08L 83/08 (2013.01); C09C 1/3081 (2013.01); C09C 3/12 (2013.01);
Abstract

Radically polymerizable silane according to the general formula I in which Ris a linear or branched aliphatic C-C-alkyl radical, phenyl or alkylated phenyl radical, R, Rindependently of each other in each case are absent or are a linear or branched aliphatic C-C-alkylene radical, which can be interrupted by S or O atoms, R, R, Rindependently of each other in each case are —Cl, —O—CH, —O—CH, —CHor —CH, X is CHor O, Y is absent, or is O or NR', wherein R′ is H or a C-alkyl radical, and Z is absent, or is O, NR″, —CO—O—, —CO—NR″—, —O—CO—O—, —O—CO—NR″—, or —NR″—CO—NR″—, wherein R″ is H or a C-alkyl radical and wherein the radicals Rand Rcannot be absent at the same time and Z is absent if Ror Ris absent, polycondensates based thereon and fillers surface-modified therewith.


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