The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 22, 2020

Filed:

Apr. 16, 2018
Applicant:

Beijing University of Chemical Technology, Beijing, CN;

Inventors:

Guangwen Chu, Beijing, CN;

Yong Cai, Beijing, CN;

Jianfeng Chen, Beijing, CN;

Yong Luo, Beijing, CN;

Haikui Zou, Beijing, CN;

Baochang Sun, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 53/32 (2006.01); B01D 53/78 (2006.01); B01D 53/44 (2006.01); B01D 53/56 (2006.01);
U.S. Cl.
CPC ...
B01D 53/32 (2013.01); B01D 53/44 (2013.01); B01D 53/56 (2013.01); B01D 53/78 (2013.01); B01D 2258/0283 (2013.01);
Abstract

Provided are a gas phase oxidation/decomposition and absorption integrated device and application thereof in a gas-liquid system. The device comprises a housing (), a motor (), and a boost regulator (); the housing () is internally provided with a rotating chamber () and a discharge chamber (); the rotating chamber () comprises a rotating shaft (), a turntable (), a liquid distributor (), packing layers (), a guiding round table (), a liquid inlet (), a liquid outlet (), and a first gas outlet (); the discharge chamber () is located under the rotating chamber () and comprises a discharge chamber housing () and a plasma generator.


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