The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 2020

Filed:

Apr. 11, 2018
Applicant:

Trumpf Laser—und Systemtechnik Gmbh, Ditzingen, DE;

Inventors:

Robert Schulz, Böblingen, DE;

Torsten Beck, Stuttgard, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 3/097 (2006.01); H01S 3/134 (2006.01); H05H 1/46 (2006.01); H01S 3/10 (2006.01); H01S 3/0971 (2006.01); H01S 3/223 (2006.01);
U.S. Cl.
CPC ...
H01S 3/09702 (2013.01); H01S 3/0971 (2013.01); H01S 3/10038 (2013.01); H01S 3/10046 (2013.01); H01S 3/134 (2013.01); H01S 3/2232 (2013.01); H05H 1/46 (2013.01); H05H 2001/4682 (2013.01);
Abstract

Methods, devices, and apparatus for generating plasma or laser pulses by radio frequency (RF) excitation pulses are provided. In one aspect, a method includes specifying radio frequency (RF) excitation pulses at least partially as a function of a preceding RF excitation of a medium and outputting a signal to a RF pulse generator, the signal configured to cause the RF pulse generator to generate the specified RF excitation pulses for exciting the medium to generate plasma or laser pulses. The RF excitation pulses is specified to become more strongly reduced in energy when a remaining excitation of the medium by the preceding RF excitation is higher.


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