The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 2020

Filed:

Mar. 13, 2019
Applicant:

Toyoda Gosei Co., Ltd., Kiyosu-shi, Aichi-ken, JP;

Inventors:

Takaki Niwa, Kiyosu, JP;

Toru Oka, Kiyosu, JP;

Assignee:

TOYODA GOSEI CO., LTD., Aichi-pref., JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/15 (2006.01); H01L 31/0256 (2006.01); H01L 29/78 (2006.01); H01L 29/20 (2006.01); H01L 29/417 (2006.01); H01L 29/10 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7806 (2013.01); H01L 29/1095 (2013.01); H01L 29/2003 (2013.01); H01L 29/41741 (2013.01); H01L 29/41766 (2013.01); H01L 29/7813 (2013.01);
Abstract

To suppress breakage of a diode. A semiconductor device comprises a stacked body and a first electrode. The stacked body includes a first nitride semiconductor layer, a second nitride semiconductor layer, a third nitride semiconductor layer, and a fourth nitride semiconductor layer that are stacked in sequence. The first electrode is in contact with a surface of the first nitride semiconductor layer that is opposite to a surface in contact with the second nitride semiconductor layer. The semiconductor device includes a transistor forming region and a diode forming region adjacent to the transistor forming region. The transistor forming region includes a first groove, a second electrode, and a third electrode. The first groove has a bottom portion located in the second nitride semiconductor layer. The second electrode is formed on a surface of the first groove. The third electrode is in contact with a surface of the fourth nitride semiconductor layer that is opposite to a surface in contact with the third nitride semiconductor layer. The diode forming region includes a second groove and a Schottky electrode. The second groove has a bottom portion located in the third nitride semiconductor layer. The Schottky electrode makes a Schottky barrier junction with the third nitride semiconductor layer and is electrically connected to the third electrode.


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