The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10777581 B1

PDF
Full Text
Expired
Date of Patent:
Sep. 15, 2020

Filed:

Jul. 06, 2017
Applicant:

Wuhan China Star Optoelectronics Technology Co., Ltd., Wuhan, Hubei, CN;

Inventor:

Songshan Li, Hubei, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/12 (2006.01); H01L 27/32 (2006.01); H01L 29/08 (2006.01); H01L 29/417 (2006.01); H01L 31/0224 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1225 (2013.01); H01L 27/3246 (2013.01); H01L 29/0847 (2013.01); H01L 29/41733 (2013.01); H01L 31/022475 (2013.01);
Abstract

A method for manufacturing an IGZO thin-film transistor includes: manufacturing a buffer layer, an active layer, a gate electrode layer, and a gate insulator layer in sequence on a substrate, and performing a patterning process; depositing a transparent insulating metal oxide layer on the patterned buffer layer, the active layer, the gate electrode layer, and the gate insulator layer by sputtering, and annealing the transparent insulating metal oxide layer so as to improve electric properties of a thin-film transistor; depositing a dielectric layer on the transparent insulating metal oxide layer, and patterning the dielectric layer and the transparent insulating metal oxide layer by means of a photolithography process and a dry etch process; depositing S/D (source/drain) contact regions on the dielectric layer; and performing a patterning process.


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