The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 2020

Filed:

Mar. 30, 2020
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;

Inventors:

Jonghyuk Park, Hwaseong-si, KR;

Byoungho Kwon, Hwaseong-si, KR;

Inho Kim, Ansan-si, KR;

Hyesung Park, Anyang-si, KR;

Jin-Woo Bae, Yongin-si, KR;

Yanghee Lee, Incheon, KR;

Inseak Hwang, Suwon-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/108 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
H01L 27/10855 (2013.01); H01L 22/32 (2013.01); H01L 22/34 (2013.01); H01L 27/10817 (2013.01); H01L 27/10876 (2013.01); H01L 27/10894 (2013.01); H01L 27/10814 (2013.01);
Abstract

Provided are a semiconductor device and a method of fabricating the same. The semiconductor device may include a semiconductor substrate including a first region and a second region, a dummy separation pattern provided on the second region of the semiconductor substrate to have a recessed region at its upper portion, a first electrode provided on the first region of the semiconductor substrate, a dielectric layer covering the first electrode, a second electrode provided on the dielectric layer, and a remaining electrode pattern provided in the recessed region. The second electrode and the remaining electrode pattern may be formed of a same material.


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