The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10777433 B1

PDF
Full Text
Expired
Date of Patent:
Sep. 15, 2020

Filed:

Jul. 23, 2018
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Wei Lin, Albany, NY (US);

Spyridon Skordas, Troy, NY (US);

Robert R. Young, Jr., Poestenkill, NY (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 23/00 (2006.01); B23K 20/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67092 (2013.01); B23K 20/02 (2013.01); H01L 24/75 (2013.01); H01L 24/80 (2013.01); H01L 24/83 (2013.01); H01L 24/94 (2013.01); H01L 2224/751 (2013.01); H01L 2224/7501 (2013.01); H01L 2224/753 (2013.01); H01L 2224/7525 (2013.01); H01L 2224/75744 (2013.01); H01L 2224/75745 (2013.01); H01L 2224/802 (2013.01); H01L 2224/80065 (2013.01); H01L 2224/80075 (2013.01); H01L 2224/80093 (2013.01); H01L 2224/80201 (2013.01); H01L 2224/80203 (2013.01); H01L 2224/80896 (2013.01); H01L 2224/8301 (2013.01); H01L 2224/94 (2013.01); H01L 2924/37001 (2013.01);
Abstract

A wafer bonding method includes placing a first wafer on a first bonding framework including a plurality of outlet holes around a periphery of the first bonding framework. A second wafer is placed on a second bonding framework that includes a plurality of inlet holes around a periphery of the second bonding framework. The first bonding framework is in overlapping relation to the second bonding framework such that a gap exist between the first wafer and the second wafer. A gas stream is circulated through the gap between the first wafer and the second wafer entering the gap through one or more of the plurality of inlet holes and exiting the gap through one or more of the plurality of outlet holes. The gas stream replaces any existing ambient moisture from the gap between the first wafer and the second wafer.


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