The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2020
Filed:
Oct. 02, 2017
Applicants:
Fundació Institut DE Ciències Fotòniques, Castelldefels, Barcelona, ES;
Institució Catalana DE Recerca I Estudis Avançats, Barcelona, ES;
Inventors:
Valerio Pruneri, Castelldefels, ES;
Rinu Abraham Maniyara, Castelldefels, ES;
Assignees:
FUNDACIO INSTITUT DE CIENCIES FOTONIQUES, Castelldefels (Barcelona), ES;
INSTITUCIO CATALANA DE RECERCA I ESTUDIS AVANCATS, Barcelona, ES;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/24 (2012.01); G03F 7/20 (2006.01); G03F 1/38 (2012.01); G03F 1/22 (2012.01);
U.S. Cl.
CPC ...
G03F 1/24 (2013.01); G03F 1/22 (2013.01); G03F 1/38 (2013.01); G03F 7/70283 (2013.01);
Abstract
The present invention is directed to compositions for photolithographic masks comprising a substrate and a coating having at least one electrical conducting layer comprising a nitride, a boride or a carbide, and methods of making the same.