The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 2020

Filed:

Nov. 14, 2017
Applicant:

Apple Inc., Cupertino, CA (US);

Inventors:

Douglas Weber, Arcadia, CA (US);

Christopher Prest, San Francisco, CA (US);

David Pakula, San Francisco, CA (US);

Stephen Paul Zadesky, Portola Valley, CA (US);

Assignee:

Apple Inc., Cupertino, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 15/04 (2006.01); C23C 14/02 (2006.01); C23C 14/04 (2006.01); B05D 5/06 (2006.01); C03C 17/36 (2006.01); C03C 17/38 (2006.01); C03C 17/34 (2006.01); B05D 7/00 (2006.01);
U.S. Cl.
CPC ...
B32B 15/04 (2013.01); B05D 5/06 (2013.01); C03C 17/3411 (2013.01); C03C 17/3607 (2013.01); C03C 17/3636 (2013.01); C03C 17/3649 (2013.01); C03C 17/3684 (2013.01); C03C 17/38 (2013.01); C23C 14/024 (2013.01); C23C 14/042 (2013.01); B05D 5/068 (2013.01); B05D 7/52 (2013.01); Y10T 428/265 (2015.01); Y10T 428/31645 (2015.04); Y10T 428/31678 (2015.04); Y10T 428/31681 (2015.04); Y10T 428/31692 (2015.04); Y10T 428/31855 (2015.04);
Abstract

Techniques, processes and structures are disclosed for providing markings on products, such as electronic devices. For example, the markings can be formed using physical vapor deposition (PVD) processes to deposit a layer of material. The markings or labels may be textual and/or graphic. The markings are deposited on a compliant layer that is disposed on a surface to be marked. The compliant layer is arranged to isolate the surface to be marked from the layer of material deposited using the PVD process.


Find Patent Forward Citations

Loading…