The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 2020

Filed:

Jul. 17, 2017
Applicant:

Samsung Display Co., Ltd., Yongin-si, KR;

Inventors:

Daehwan Jang, Seoul, KR;

Seung-Won Park, Seoul, KR;

Baehyoun Jung, Seongnam-si, KR;

Eunjung Kim, Suwon-si, KR;

Jihun Kim, Hwaseong-si, KR;

Yunjong Yeo, Seoul, KR;

Hyungbin Cho, Seongnam-si, KR;

Sang-Hoon Lee, Cheonan-si, KR;

Yong-Hwan Ryu, Cheonan-si, KR;

Sung-Young Choi, Hwaseong-si, KR;

Hyunju Kang, Yongin-si, KR;

Assignee:

Samsung Display Co., Ltd., Yongin-si, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 33/42 (2006.01); B29C 33/38 (2006.01); G03F 7/00 (2006.01); B29C 35/08 (2006.01); B29C 59/04 (2006.01);
U.S. Cl.
CPC ...
B29C 33/428 (2013.01); B29C 33/3807 (2013.01); B29C 33/3842 (2013.01); B29C 33/424 (2013.01); G03F 7/0002 (2013.01); B29C 59/046 (2013.01); B29C 2035/0827 (2013.01); B29K 2845/00 (2013.01);
Abstract

A method of manufacturing a roll type imprint master mold including disposing a base layer on a substrate including a first area and a second area adjacent to the first area, disposing an inorganic insulation layer on the base layer, forming a first mask pattern and a first resin pattern in the first area, forming a pattern layer by etching the inorganic insulation layer using the first resin and the first mask patterns as a mask, removing the first resin and the first mask patterns, forming a second mask pattern and a second resin pattern in the second area, forming a pattern layer by etching the inorganic insulation layer using the second resin and the second mask patterns as a mask, removing the second resin and the second mask patterns, separating the base layer from the substrate, and attaching the base layer onto a roll body.


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