The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 08, 2020

Filed:

Mar. 31, 2017
Applicant:

Fuji Corporation, Chiryu, JP;

Inventor:

Wataru Kusaka, Okazaki, JP;

Assignee:

FUJI CORPORATION, Chiryu, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05H 1/24 (2006.01);
U.S. Cl.
CPC ...
H05H 1/24 (2013.01);
Abstract

A plasma generation device including an electric power supply device to supply electric power to multiple electrodes arranged in a reaction chamber; a processing gas supply device to supply a processing gas to the reaction chamber; and a control device to control operation of the electric power supply device and the processing gas supply device in either of a first operation mode in which, when a stop signal is received while electric power is being supplied to the electrodes in a state with the processing gas being supplied to the reaction chamber, supply of electric power to the electrodes is stopped and supply of the processing gas to the reaction chamber is stopped, and a second operation mode in which supply of electric power to the electrodes is stopped, but the processing gas continues to be supplied to the reaction chamber.


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