The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2020
Filed:
Feb. 10, 2018
Applicant:
Goodrich Corporation, Charlotte, NC (US);
Inventor:
Ian Peter Humphrey, Foxboro, MA (US);
Assignee:
Goodrich Corporation, Charlotte, NC (US);
Primary Examiner:
Int. Cl.
CPC ...
G01S 17/89 (2020.01); H04N 5/232 (2006.01); G06T 7/521 (2017.01); G06T 15/00 (2011.01); H04N 3/14 (2006.01); H04N 5/265 (2006.01); G08G 5/04 (2006.01); G01S 17/87 (2020.01); G01S 17/933 (2020.01);
U.S. Cl.
CPC ...
H04N 5/23232 (2013.01); G01S 17/87 (2013.01); G01S 17/89 (2013.01); G01S 17/933 (2013.01); G06T 7/521 (2017.01); G06T 15/00 (2013.01); G08G 5/04 (2013.01); H04N 3/1562 (2013.01); H04N 5/23238 (2013.01); H04N 5/265 (2013.01); G06T 2207/10028 (2013.01); G06T 2207/20221 (2013.01); G06T 2207/30261 (2013.01);
Abstract
A distributed aperture system includes a first aperture and a second aperture. The first aperture has a first field of regard and a first resolution. The second aperture has a second aperture and a second resolution and a second field of regard. The second field of regard overlaps the first field of regard and the second resolution is greater than the first resolution to provide high resolution heading information and low resolution peripheral information in a common 3D image for obstacle avoidance. Obstacle avoidance systems and imaging methods are also described.