The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 08, 2020

Filed:

Feb. 05, 2018
Applicant:

Zhuhai Crystal Resonance Technologies Co., Ltd., Zhuhai, CN;

Inventor:

Dror Hurwitz, Zhuhai, CN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H03H 3/02 (2006.01); H03H 9/10 (2006.01); H03H 9/17 (2006.01); H03H 9/02 (2006.01); H03H 9/13 (2006.01); H03H 9/58 (2006.01); H03H 9/60 (2006.01);
U.S. Cl.
CPC ...
H03H 3/02 (2013.01); H03H 9/02031 (2013.01); H03H 9/02102 (2013.01); H03H 9/02401 (2013.01); H03H 9/1014 (2013.01); H03H 9/132 (2013.01); H03H 9/173 (2013.01); H03H 9/584 (2013.01); H03H 9/587 (2013.01); H03H 9/588 (2013.01); H03H 9/605 (2013.01); H03H 2003/021 (2013.01); H03H 2003/023 (2013.01); H03H 2003/027 (2013.01); Y10T 29/42 (2015.01); Y10T 29/49005 (2015.01);
Abstract

A method of fabricating an FBAR filter device including an array of resonators, each resonator comprising a single crystal piezoelectric film sandwiched between a first metal electrode and a second metal electrode, wherein the first electrode is supported by a support membrane over an air cavity, the air cavity embedded in a silicon dioxide layer over a silicon handle, with through-silicon via holes through the silicon handle and into the air cavity, the side walls of said air cavity in the silicon dioxide layer being defined by perimeter trenches that are resistant to a silicon oxide etchant.


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