The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 08, 2020

Filed:

Aug. 29, 2019
Applicant:

Imec Vzw, Leuven, BE;

Inventors:

Frederic Lazzarino, Hamme-Mille, BE;

Victor M. Blanco, Leefdaal, BE;

Assignee:

IMEC VZW, Leuven, BE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/033 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0337 (2013.01); H01L 21/31144 (2013.01);
Abstract

An example embodiment includes a patterning method comprising: forming a layer stack comprising a target layer, a lower memorization layer and an upper memorization layer, forming above the upper memorization layer a first mask layer, patterning a set of upper trenches in the upper memorization layer, forming a first block pattern, the first block pattern comprising a set of first blocks, patterning a first set of lower trenches in the lower memorization layer, patterning the patterned upper memorization layer to form a second block pattern comprising a set of second blocks, forming above the patterned lower memorization layer and the second block pattern a second mask layer, patterning a second set of lower trenches in the patterned lower memorization layer, the patterning comprising using the second mask layer, the spacer layer and the second block pattern as an etch mask.


Find Patent Forward Citations

Loading…