The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2020
Filed:
Aug. 30, 2018
Samsung Electronics Co., Ltd., Suwon-si, KR;
Industry-academic Cooperation Foundation, Yonsei University, Seoul, KR;
In-Joong Kim, Seoul, KR;
Il Gu Yun, Seoul, KR;
SAMSUNG ELECTRONICS CO., LTD., Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do, KR;
INDUSTRY-ACADEMIC CORPERATION FOUNDATION, YONSEI UNIVERSITY, Yonsei-ro, Seodaemun-gu, Seoul, KR;
Abstract
A plasma processing apparatus is provided. The plasma processing apparatus includes a chamber configured to perform a plasma process on a wafer, a viewport configured to transmit plasma light generated in the chamber, a rotation module coupled to the viewport to be rotatable around a rotation axis, and an OES (Optical Emission Spectroscopy) device which is coupled to the rotation module and configured to receive the plasma light, wherein the rotation module includes a first surface facing the viewport and a second surface facing the OES device, wherein the first surface is configured to block a part of the plasma light, and includes a first opening through which an inside of the rotation module is configured to be exposed to a part of the plasma light, and wherein the second surface includes a second opening configured to be in light communication with the first opening.