The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2020
Filed:
Mar. 27, 2020
Applicant:
Hover, Inc, San Francisco, CA (US);
Inventors:
Shaohui Sun, Mountain View, CA (US);
Ioannis Pavlidis, Redwood City, CA (US);
Adam J. Altman, San Francisco, CA (US);
Assignee:
HOVER Inc., San Francisco, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06T 17/05 (2011.01); G06K 9/00 (2006.01); G06T 17/00 (2006.01); G06T 15/04 (2011.01); G06F 3/14 (2006.01); G06T 15/20 (2011.01); G06T 19/00 (2011.01); G06T 19/20 (2011.01);
U.S. Cl.
CPC ...
G06T 17/05 (2013.01); G06F 3/14 (2013.01); G06K 9/00214 (2013.01); G06K 9/00637 (2013.01); G06T 15/04 (2013.01); G06T 15/20 (2013.01); G06T 17/00 (2013.01); G06T 19/003 (2013.01); G06T 19/20 (2013.01); G06T 2200/08 (2013.01); G06T 2200/24 (2013.01); G06T 2207/10028 (2013.01); G06T 2210/04 (2013.01); G06T 2210/56 (2013.01); G06T 2219/2008 (2013.01);
Abstract
Systems and methods are described for adjusting planar geometry derived from point cloud data associated with a building object by identifying major aspects like vertices and edges of the underlying structure within the point cloud and adjusting an average planar fit for simplified geometries created from the point cloud. Combining the planar geometry or point cloud with orthogonal or street level views improves accuracy and use cases of the planar geometry.